Publications (26)
International Symposium on Memory Systems |
September 2021 |
DRAM Refresh with Master Wordline Granularity Control of Refresh Intervals |
13th Workshop on Low Temperature Electronics |
September 2018 |
Some Like It Cold: Initial Testing Results for Cryogenic Computing Component |
International Memory Workshop |
May 2018 |
DRAM Retention at Cryogenic Temperatures |
Journal of Electronic Imaging |
April 2018 |
Optimization of CMOS image sensor utilizing variable temporal multisampling partial transfer technique to achieve full-frame high dynamic range with superior low light and stop motion capability |
Electronic Imaging |
February 2017 |
Optimization of CMOS image sensor utilizing variable temporal multi-sampling partial transfer technique to achieve full-frame high dynamic range with superior low light and stop motion capability |
International Symposium on Circuits and Systems |
May 2017 |
Reducing electrical power dissipation in computational imaging systems through special-purpose optics |
COSI |
July 2016 |
Optical Performance of Computational Diffractive Imagers |
VLSI Symposium |
June 2016 |
Lensless Smart Sensors: Optical and Thermal Sensing for the IoT |
Sensors Magazine |
April 2016 |
Reduction of CMOS Image Sensor Read Noise to Enable Photon Counting |
IISW |
June 2015 |
A 2MP Oversampling Image Sensor with 2.75μs Row Time and Conditional Threshold Comparison |
COSI |
June 2015 |
Computational Diffractive Imager with Low-Power Image Change Detection |
ISCE |
June 2014 |
Non-Destructive Threshold Assessment of a Pinned Photo Diode Pixel with Correlated Double Sampling |
JEI |
January 2014 |
Hardware Validated Unified Model of Multibit Temporally and Spatially Oversampled Image Sensors with Conditional Reset |
ICIP |
August 2013 |
Multichannel Sampling of Low Light Level Scenes with Unknown Shifts |
IISW |
June 2013 |
Overcoming the Full Well Capacity Limit: High Dynamic Range Imaging Using Multi-Bit Temporal Oversampling and Conditional Reset |
IEEE Sensors Conference |
October 2012 |
High-Dynamic-Range Binary Pixel Processing Using Non-Destructive Reads and Variable Oversampling and Thresholds |
Micro |
December 2010 |
Understanding the Energy Consumption of Dynamic Random Access Memories |
JSSCC |
January 2005 |
A 3.6-Gb/s Point-to-Point Heterogeneous-Voltage-Capable DRAM Interface for Capacity-Scalable Memory Subsystems |
ISSCC |
February 2004 |
A 2Gb/s Point-to-Point Heterogeneous Voltage Capable DRAM Interface for Capacity-Scalable Memory Subsystems |
VLSI Symposium |
June 2002 |
A 110nm 512Mb DDR DRAM with Vertical Transistor Trench Cell |
SSDM |
September 1994 |
Modelling and Fabrication of a P-Channel SiGe-MOSFET with Very High Mobility and Transconductance |
TED |
September 1994 |
A Comparison of Numerical Solutions of the Boltzmann Transport Equation for High-Energy Electron Transport Silicon |
APL |
July 1993 |
Electron Transport in Strained Si Layers on Si1-xGx substrates |
TED |
November 1992 |
Electron Mobilities and High-Field Drift Velocities in Strained Silicon on Silicon-Germanium Substrates |
JAP |
August 1991 |
A Novel Approach for Including Band-Structure Effects in a Monte Carlo Simulation of Electron Transport in Silicon |
ESSDERC |
September 1989 |
Charge transport near the Si/SiO2 Interface in MOSFET Devices |
Patents (133)
US 12,170,126 B2 |
Stacked DRAM Device and Method of Manufacture |
US 12,086,441 B2 |
Block Copy |
US 12,072,807 B2 |
Storage and Access of Data and Tags in a Multi-way Set Associative Cache |
US 12,026,104 B2 |
Multiple Precision Memory System |
US 12,020,740 B2 |
Memory Device Having Non-Uniform Refresh |
US 12,001,697 B2 |
Multi-Modal Refresh of Dynamic Random Access Memory |
US 11,989,430 B2 |
Memory Module with Persistent Calibration |
US 11,972,121 B2 |
Load-Reduced DRAM Stack |
US 11,934,654 B2 |
Memory Device Having Hidden Refresh |
US 11,922,066 B2 |
Stacked Device Communication |
US 11,868,619 B2 |
Partial Array Refresh Timing |
US 11,842,762 B2 |
System Application of DRAM Component with Cache Mode |
US 11,842,761 B2 |
Memory System with Multiple Open Rows per Bank |
US 11,823,734 B2 |
DRAM Device with Multiple Voltage Domains |
US 11,822,822 B2 |
Memory Component Having Internal Read-Modify-Write Operation |
US 11,804,250 B2 |
Memory with Deferred Fractional Row Activation |
US 11,775,213 B2 |
Stacked Memory Device with Paired Channels |
US 11,646,090 B2 |
DRAM Retention Test Method for Dynamic Error Correction |
US 11,645,212 B2 |
Dynamic Processing Speed |
US 11,600,349 B2 |
Testing Through-Silicon-Vias |
US 11,347,441 B2 |
Memory Component Having Internal Read-Modify-Write Operation |
US 11,341,086 B2 |
Compute Accelerator with 3D Data Flows |
US 11,284,034 B2 |
Fractional-Readout Oversampled Image Sensor |
US 11,270,741 B2 |
Deferred Fractional Memory Row Activation |
US 11,257,539 B2 |
Reduced Transport Energy in a Memory System |
US 11,227,639 B2 |
Stacked DRAM Device and Method of Manufacture |
US 11,114,150 B2 |
Memory System with Multiple Open Rows per Bank |
US 11,109,512 B2 |
Memory Subsystem for a Cryogenic Digital System |
US 11,069,392 B2 |
Memory Component with Efficient Write Operations |
US 11,032,495 B1 |
Shared-Counter Image Sensor |
US 11,029,216 B1 |
IC With Strategically Biased Digital Circuitry |
US 11,012,649 B2 |
Feedthrough-Compensated Image Sensor |
US 11,011,248 B2 |
DRAM Retention Test Method for Dynamic Error Correction |
US 11,004,530 B2 |
Testing Through-Silicon-Vias |
US 10,885,946 B2 |
Stacked DRAM Device and Method of Manufacture |
US 10,860,253 B2 |
Memory Component Having Internal Read-Modify-Write Operation |
US 10,839,884 B2 |
Memory Component with Efficient Write Operations |
US 10,811,062 B2 |
Deferred Fractional Memory Row Activation |
US 10,798,322 B2 |
High Dynamic-Range Image Sensor |
US 10,706,913 B2 |
Reduced Transport Energy in a Memory System |
US 10,659,715 B2 |
Fractional-Readout Oversampled Image Sensor |
US 10,652,493 B2 |
Low-Noise High Dynamic-Range Image Sensor |
US 10,652,435 B2 |
Methods and Systems for Reducing Image Artifacts |
US 10,614,859 B2 |
Stacked DRAM Device and Method of Manufacture |
US 10,594,973 B2 |
Conditional-reset, Multi-bit Read-out Image Sensor |
US 10,497,457 B2 |
DRAM Retention Test Method for Dynamic Error Correction |
US 10,388,337 B2 |
Memory with Deferred Fractional Row Activation |
US 10,378,967 B1 |
Dual Temperature Band Integrated Circuit Device |
US 10,362,256 B2 |
Fractional-Readout Oversampled Image Sensor |
US 10,356,350 B2 |
Dark-Emulation Image Sensor |
US 10,277,843 B2 |
Oversampled Image Sensor with Conditional Pixel Readout |
US 10,274,652 B2 |
Systems and Methods for Improving Resolution in Lensless Imaging |
US 10,269,411 B2 |
Memory Controller and Memory Device Command Protocol |
US 10,264,195 B1 |
Shared-Counter Image Sensor |
US 10,262,750 B2 |
Testing Through-Silicon Vias |
US 10,261,584 B2 |
Touchless Interface for Handheld and Wearable Computers |
US 10,249,660 B2 |
Split-Gate Conditional-Reset Image Sensor |
US 10,248,358 B2 |
Memory Component Having Internal Read-Modify-Write Operation |
US 10,204,662 B2 |
Stacked DRAM Device and Method of Manufacture |
US 10,199,089 B2 |
Reduced Transport Energy in a Memory System |
US 10,165,209 B2 |
Low-Noise High Dynamic-Range Image Sensor |
US 10,154,220 B2 |
Imaging System with Dynamic Reconstruction Workload Allocation |
US 10,136,090 B2 |
Threshold Monitoring, Conditional-Reset Image Sensor |
US 10,104,318 B2 |
High Dynamic-Range Image Sensor |
US 10,070,084 B2 |
Image Sensor with Multi-Range Readout |
US 9,983,830 B2 |
Memory Component Having Internal Read Modify-Write Operation |
US 9,911,468 B2 |
Memory with Deferred Fractional Row Activation |
US 9,894,304 B1 |
Line Interleaved Image Sensors |
US 9,875,787 B2 |
Reduced Transport Energy in a Memory System |
US 9,826,176 B1 |
Shared Counter Image Sensor |
US 9,691,504 B2 |
DRAM Retention Test Method for Dynamic Error Correction |
US 9,681,071 B2 |
Image Sensor with Exception Coded Output Compression |
US 9,667,898 B2 |
Conditional Reset, Multi-Bit Read-Out Image Sensor |
US 9,666,238 B2 |
Stacked DRAM Device and Method of Manufacture |
US 9,575,835 B2 |
Error Correction in a Memory Device |
US 9,570,196 B2 |
Testing Through-Silicon-Vias |
US 9,570,144 B2 |
Memory Refresh Method and Devices |
US 9,570,126 B2 |
Memory with Deferred Fractional Row Activation |
US 9,548,102 B2 |
Multi-die DRAM Banks Arrangement and Wiring |
US 9,521,351 B1 |
Fractional Readout Oversampled Image Sensor |
US 9,521,349 B2 |
Image Sensor Architecture with Power Saving Readout |
US 9,521,338 B2 |
Image Sensor Sampled at Non-Uniform Intervals |
US 9,515,008 B2 |
Techniques for Interconnecting Stacked Dies Using Connection Sites |
US 9,491,391 B2 |
Image Sensor with Threshold-Based Output Encoding |
US 9,438,826 B2 |
Pixel Structure and Reset Scheme |
US 9,437,280 B2 |
DRAM Sense-Amplifier that Supports Low Memory-Cell Capacitance |
US 9,432,597 B2 |
Low-Noise High Dynamic-Range Image Sensor |
US 9,411,678 B1 |
DRAM Retention Monitoring Method for Dynamic Error Correction |
US 9,380,245 B1 |
Conditional-Reset Image Sensor with Analog Counter Array |
US 9,361,960 B2 |
Configurable Memory Banks of a Memory Device |
US 9,344,635 B2 |
Conditionally-Reset, Temporally Oversampled Image Sensor |
US 9,330,735 B2 |
Memory with deferred fractional row activation |
US 9,287,239 B2 |
Techniques for Interconnecting Stacked Dies Using Connection Sites |
US 9,286,965 B2 |
Memory Refresh Method and Devices |
US 9,264,639 B2 |
Feedthrough-Compensated Image Sensor |
US 9,256,376 B2 |
Methods and Circuits for Dynamically Scaling DRAM Power and Performance |
US 9,214,219 B2 |
Distributed Sub-Page Selection |
US 9,116,781 B2 |
Memory Controller and Memory Device Command Protocol |
US 9,111,588 B2 |
Multi-Die DRAM Banks Arrangement and Wiring |
US 9,037,949 B1 |
Error Correction in a Memory Device |
US 9,036,065 B1 |
Shared-Counter Image Sensor |
US 9,001,606 B2 |
Memory Methods and Systems with Adiabatic Switching |
US 9,001,251 B2 |
Oversampled Image Sensor with Conditional Pixel Read-Out |
US 8,982,598 B2 |
Stacked Memory Device with Redundant Resources to Correct Defects |
US 8,930,779 B2 |
Bit-Replacement Technique for DRAM Error Correction |
US 8,908,454 B2 |
Memory Architecture with Redundant Resources |
US 8,885,423 B2 |
DRAM Sense-Amplifier that Supports Low Memory-Cell Capacitance |
US 8,811,095 B2 |
Methods and Circuits for Dynamically Scaling DRAM Power and Performance |
US 8,717,797 B2 |
Semiconductor Memory Device with Hierarchical Bitlines |
US 8,473,808 B2 |
Semiconductor Memory Having Non-Standard Form Factor |
US 7,956,644 B2 |
Peak Power Reduction using Fixed Bit Inversion |
US 7,937,631 B2 |
Method for Self-Test and Self-Repair in a Multi-Chip Package Environment |
US 7,797,511 B2 |
Memory Refresh System and Method |
US 7,440,347 B1 |
Circuit and Method to Find Wordline-Bitline Shorts in a DRAM |
US 7,375,999 B2 |
Low Equalized Sense-Amp for Twin Cell DRAMs |
US 7,342,291 B2 |
Standby Current Reduction over a Process Window with a Trimmable Well Bias |
US 7,333,383 B2 |
Fuse Resistance Readout Circuit |
US 7,293,190 B2 |
Noisy Clock Test Method and Apparatus |
US 7,254,089 B2 |
Memory with Selectable Single Cell or Twin Cell Configuration |
US 7,227,799 B2 |
Sense Amplifier for Eliminating Leakage Current due to Bit Line Shorts |
US 7,060,566 B2 |
Standby Current Reduction over a Process Window with a Trimmable Well Bias |
US 7,060,529 B2 |
Multiple Chip Semiconductor Arrangement Having Electrical Components in Separating Regions |
US 6,815,803 B1 |
Multiple Chip Semiconductor Arrangement Having Electrical Components in Separating Regions |
US 6,813,193 B2 |
Memory Device and Method of Outputting Data from a Memory Device |
US 6,730,989 B1 |
Semiconductor Package and Method |
US 6,369,606 B1 |
Mixed Threshold Voltage CMOS Logic Device and Method for Manufacture Thereof |
US 6,160,747 |
Configuration for Crosstalk Attenuation in Word Lines of DRAM Circuits |
US 6,067,261 |
Timing of Wordline Activation for DC Burn-In of a DRAM with the Self-Refresh |
US 6,049,492 |
Integrated Sense-Amplifier with a Single-Sided Precharge Device |
US 5,612,233 |
Method for Manufacturing a Single Electron Component |
US 5,559,353 |
Integrated Circuit Structure Having at Least One CMOS NAND Gate and Method for the Manufacture Thereof |
US 5,540,977 |
Microelectronic Component |
US 5,443,992 |
Method for Manufacturing an Integrated Circuit Having at Least One MOS Transistor. |